Description
This copper (Cu) sputter target is designed for use in sputter coaters, offering a precise 42mm diameter for consistent material deposition. Manufactured by Electron Microscopy Sciences, it is engineered to meet the demands of microscopy applications. The target is sold individually and is a key component for achieving high-quality sample preparation in electron microscopy.
- Copper (Cu) sputter target
- 42mm diameter
- Manufactured by Electron Microscopy Sciences
- Sold individually
Shop today for the Cu Sputter Target to meet your requirements!
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