Description
This sputtering target is specifically designed for use with Electron Microscopy Sciences equipment. It features a 20.4 mm diameter and is constructed from high-quality titanium, ensuring reliable performance in sputtering applications. This target is an essential component for preparing samples for advanced microscopy techniques.
- Constructed from durable titanium
- Precisely machined to 20.4 mm diameter
- Designed for optimal sputtering performance
Equip your lab with this essential sputtering target for your microscopy needs!
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