Description
This sputtering target is constructed from high-quality titanium, designed for use in electron microscopy applications. It features a precise 54mm diameter, ensuring compatibility with standard sputtering equipment. Manufactured by Electron Microscopy Sciences, this target is a reliable component for achieving consistent results in thin film deposition processes.
- Constructed from titanium
- 54mm diameter
- Designed for sputtering applications
Enhance your microscopy research with this essential sputtering target.
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