Description
This sputtering target, identified by catalog number 91016-AP, is composed of a Gold-Palladium alloy with a 60:40 ratio. It is designed for use in sputtering coaters and is precisely manufactured to a diameter of 54mm. This target is an essential component for applications requiring thin film deposition in electron microscopy and related fields, ensuring high-quality sample preparation for detailed imaging and analysis.
- Gold-Palladium (60:40) alloy composition
- 54mm diameter
- Designed for sputtering coaters
Enhance your sample preparation capabilities with this high-quality sputtering target.






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