Description
This sputtering target is specifically designed for platinum applications, featuring a precise 20.4mm diameter. Manufactured by Electron Microscopy Sciences, it is engineered to meet the rigorous demands of sputtering processes in microscopy and related fields. Its high-quality construction ensures consistent performance and reliability for critical sample preparation tasks.
- High-purity platinum material for optimal sputtering.
- Precise 20.4mm diameter for compatibility with standard equipment.
- Manufactured by Electron Microscopy Sciences for assured quality.
Enhance your microscopy workflow with this essential sputtering target.
Reviews
There are no reviews yet.