50310-05 Electron Microscopy Sciences Kempad-Pan W Polishing Cloth, PSA, No Hole

Description

The Kempad-Pan W Polishing Cloth from Electron Microscopy Sciences, identified by MPN 50310-05, is designed for intermediate and final polishing applications. It is recommended for use with diamond abrasive compounds, ensuring a high-quality finish in critical microscopy work. This cloth features a PSA (Pressure Sensitive Adhesive) backing and a ‘No Hole’ configuration, facilitating precise application and handling during sensitive polishing processes.

• Recommended for intermediate and final polishing with diamond abrasive compounds.
• Features PSA backing for secure application.
• ‘No Hole’ design for precise handling.

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