91007-TA Electron Microscopy Sciences Sputtering Target Tantalum, 20.4mm Dia

Description

This sputtering target is specifically designed for use with sputter coaters, featuring a Tantalum (Ta) composition. It has a precise diameter of 20.4 mm, ensuring compatibility with standard equipment. Manufactured by Electron Microscopy Sciences, this target is built to deliver consistent performance for critical applications in microscopy and material science.

• High-quality Tantalum sputtering target
• Precisely machined to 20.4mm diameter
• Designed for use in sputter coaters
• Manufactured by Electron Microscopy Sciences

Enhance your microscopy research with this reliable sputtering target!