Description
This Gold/Palladium sputtering target, identified by part number 91017-AP, is designed for applications requiring precise thin film deposition. It features a composition of 60:40 Gold to Palladium, ensuring consistent performance in sputtering processes. The target has a standard diameter of 57mm and a thickness of 0.1mm, making it suitable for various sputtering equipment. Manufactured by Electron Microscopy Sciences, this target is a reliable component for research and industrial applications in microscopy and materials science.
- Gold/Palladium (60:40) composition
- Standard 57mm diameter
- 0.1mm thickness
- Designed for sputtering applications
Order the 91017-AP Gold/Palladium Sputtering Target today to enhance your material deposition processes!






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