Description
This sputtering target is specifically designed for use in electron microscopy applications. It features a high-purity gold (Au) composition, ensuring excellent conductivity and sample preparation for imaging. The target has a standard diameter of 57 mm and a thickness of 0.1 mm, making it compatible with various sputtering equipment. Manufactured by Electron Microscopy Sciences, this target is a reliable component for achieving optimal results in microscopy sample coating.
- High-purity Gold (Au) composition
- Standard 57 mm diameter
- 0.1 mm thickness
- Designed for electron microscopy applications
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