91030-CU Electron Microscopy Sciences Annular Target, 117 mm OD x 89 mm ID, Cu

Description

This Cu Annular Sputter Target from Electron Microscopy Sciences is designed for precision applications in electron microscopy. It features a specific outside diameter of 117 mm and an inside diameter of 89 mm, ensuring compatibility with standard sputtering equipment. Manufactured with high-quality copper, this target provides reliable performance for sample preparation and analysis. Its robust construction is ideal for demanding laboratory environments.

• Copper (Cu) composition for sputtering applications.
• Precise dimensions: 117 mm Outside Diameter (OD) and 89 mm Inside Diameter (ID).
• Designed for use in electron microscopy and related analytical techniques.

Enhance your research capabilities with this essential component for electron microscopy.