91009-CU Electron Microscopy Sciences Sputter Target, 39 mm Diameter

Description

This copper sputter target is designed for use with sputter coaters, providing a reliable source for thin film deposition in electron microscopy applications. It features a precise 39mm diameter, ensuring compatibility with standard equipment. Manufactured by Electron Microscopy Sciences, this target is a crucial component for sample preparation, enabling high-quality imaging.

• High-purity copper material for consistent sputtering.
• Precisely machined 39mm diameter for optimal performance.
• Designed for use in electron microscopy sample preparation.

Enhance your microscopy workflow with this essential sputter target!