Description
This sputtering target is manufactured by Electron Microscopy Sciences and is composed of Tantalum. It is designed for use in sputtering applications, providing a reliable material source for thin film deposition. The target has a diameter of 76 mm, ensuring compatibility with standard sputtering equipment.
- High-quality Tantalum material for sputtering applications.
- Precisely manufactured to 76 mm diameter.
- From Electron Microscopy Sciences, a trusted supplier.
Order your Electron Microscopy Sciences Sputtering Target today!






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